发明授权
US5336659A Antistatic subbing layer for slipping layer in dye-donor element used in
thermal dye transfer
失效
用于热染料转移的染料供体元件中的滑动层的防静电底层
- 专利标题: Antistatic subbing layer for slipping layer in dye-donor element used in thermal dye transfer
- 专利标题(中): 用于热染料转移的染料供体元件中的滑动层的防静电底层
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申请号: US125451申请日: 1993-09-22
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公开(公告)号: US5336659A公开(公告)日: 1994-08-09
- 发明人: Charles L. Bauer , Noel R. Vanier
- 申请人: Charles L. Bauer , Noel R. Vanier
- 申请人地址: NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: NY Rochester
- 主分类号: B41M5/382
- IPC分类号: B41M5/382 ; B41M5/40 ; B41M5/44 ; C08L25/00 ; C08L25/18 ; C08L33/04 ; C08L33/14 ; C08L71/02 ; C09K3/16 ; B41M5/035 ; B41M5/38
摘要:
A dye-donor element for thermal dye transfer comprising a support having on one side thereof a dye layer and on the other side thereof, in order, a subbing layer and a slipping layer, and wherein the subbing layer has antistatic properties and comprises a mixture of 1) a polymer having a molecular weight of at least about 100,000 and containing at least 25 wt. % of a repeating unit containing an alkylene oxide segment, and 2) a copolymer having the formula: ##STR1## wherein: A represents units of an addition polymerizable monomer containing at least two ethylenically unsaturated groups;B represents units of a copolymerizable .alpha.,.beta.-ethylenically unsaturated monomer;L is a carboxylic group or an aromatic ring;Q is N or P;R.sup.1, R.sup.2 and R.sup.3 each independently represents an alkyl or cycloalkyl group having from about 1 to about 20 carbon atoms, or an a ryl or aralkyl group having from about 6 to about 10 carbon atoms;R.sup.4 is H or Ch.sub.3 ;M is an anion;n is an integer of from 1 to 6;x is from about 0 to about 20 mole %;y is from about 0 to about 90 mole %; andz is from about 10 to about 100 mole %;said copolymer 2) being present in said mixture in an amount from about 30 to about 75 wt. %.
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