发明授权
- 专利标题： Reflection type photomask and reflection type photolithography method comprising a concavo-convex surface
- 专利标题（中）： 反射型光掩模和反射型光刻法，其包括凹凸表面
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申请号： US965086申请日： 1992-10-22
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公开(公告)号： US5338647A公开(公告)日： 1994-08-16
- 发明人: Kenji Nakagawa , Kenichi Kawashima
- 申请人： Kenji Nakagawa , Kenichi Kawashima
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX2-67601 19910316
- 主分类号： G03F1/70
- IPC分类号： G03F1/70 ; G03F1/00 ; G03F1/26 ; G03F1/76 ; G03F1/80 ; G03F7/20 ; H01L21/027 ; G03C5/00
摘要：
A reflection type photomask includes a substrate, and a reflecting surface formed on the substrate and including a first region and a second region which have a relative height difference. Due to the concavo-convex structure of the reflecting surface, a light reflected from the first region and a light reflected from the second region have a predetermined phase difference which may be used effectively to form a pattern on a photoresist layer.
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