发明授权
US5340765A Method for forming enhanced capacitance stacked capacitor structures
using hemi-spherical grain polysilicon
失效
使用半球形晶粒多晶硅形成增强型电容堆叠电容器结构的方法
- 专利标题: Method for forming enhanced capacitance stacked capacitor structures using hemi-spherical grain polysilicon
- 专利标题(中): 使用半球形晶粒多晶硅形成增强型电容堆叠电容器结构的方法
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申请号: US106503申请日: 1993-08-13
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公开(公告)号: US5340765A公开(公告)日: 1994-08-23
- 发明人: Charles H. Dennison , Randhir P. S. Thakur
- 申请人: Charles H. Dennison , Randhir P. S. Thakur
- 申请人地址: ID Boise
- 专利权人: Micron Semiconductor, Inc.
- 当前专利权人: Micron Semiconductor, Inc.
- 当前专利权人地址: ID Boise
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; H01L27/108 ; H01L21/70 ; H01L27/00
摘要:
The present invention develops a container capacitor by forming a conductively doped polysilicon plug between a pair of neighboring parallel conductive word lines; forming a planarized tetra-ethyl-ortho-silicate (TEOS) insulating layer over the parallel conductive word lines and the plug; forming a planarized borophosphosilicate glass (BPSG) insulating layer over the planarized tetra-ethyl-ortho-silicate (TEOS) insulative layer; forming an opening into both insulating layers to expose an upper surface of the plug, the opening thereby forming a container shape; forming first, second and third layers of conductively doped amorphous silicon into the container shape while simultaneously bleeding oxygen into the amorphous silicon; forming individual container structures having inner and outer surfaces and thereby exposing the BPSG insulating layer; removing the BPSG insulating layer thereby exposing the outer surface of the container structures; converting the exposed inner and outer surfaces of amorphous silicon into hemispherical grained polysilicon by subjecting the structures to a high vacuum anneal; forming a nitride insulating layer adjacent and coextensive the conductive container structure; and forming a second conductively doped polysilicon layer superjacent and coextensive the nitride insulating layer.
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