发明授权
- 专利标题： Electrostatic chuck for high power plasma processing
- 专利标题（中）： 静电吸盘用于大功率等离子体处理
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申请号： US984797申请日： 1992-12-02
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公开(公告)号： US5350479A公开(公告)日： 1994-09-27
- 发明人: Kenneth S. Collins , John R. Trow , Joshua C. W. Tsui , Craig A. Roderick , Nicolas J. Bright , Jeffrey Marks , Tetsuya Ishikawa
- 申请人： Kenneth S. Collins , John R. Trow , Joshua C. W. Tsui , Craig A. Roderick , Nicolas J. Bright , Jeffrey Marks , Tetsuya Ishikawa
- 申请人地址： CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： CA Santa Clara
- 主分类号： H01L21/683
- IPC分类号： H01L21/683 ; H01L21/68
摘要：
An electrostatic chuck for holding an article to be processed in a plasma reaction chamber and comprising a metal pedestal coated with a layer of dielectric material in which is formed a cooling gas distribution system for passing and distributing a cooling gas between the upper surface of the layer and the article when supported on the pedestal. The gas distribution system comprises a plurality of intersecting grooves formed entirely in the upper surface of the layer with small gas distribution holes through intersections of the grooves over upper ends of cooling gas receiving holes formed in an underside of the pedestal.
公开/授权文献
- US5947988A Surgical apparatus for tissue removal 公开/授权日：1999-09-07
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