Invention Grant
- Patent Title: Process for producing nanometer-size structures on surfaces using electron beam induced chemistry through electron stimulated desorption
- Patent Title (中): 使用电子束诱导化学通过电子刺激解吸在表面上制备纳米尺寸结构的方法
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Application No.: US954626Application Date: 1992-09-30
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Publication No.: US5352330APublication Date: 1994-10-04
- Inventor: Robert M. Wallace
- Applicant: Robert M. Wallace
- Applicant Address: TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: TX Dallas
- Main IPC: H01L21/027
- IPC: H01L21/027 ; C23C8/02 ; C23C8/80 ; C23C16/04 ; C23C16/08 ; C23C16/16 ; H01L21/20 ; H01L21/263 ; H01L21/285 ; H01L21/302 ; H01L21/3065 ; H01L21/316 ; H01L21/32 ; H01L21/00
Abstract:
The process of using electron beam induced stimulated desorption chemistry to produce structures of nanometer order size on surfaces. By passivating a reconstructed surface and selectively removing such passivation with an electron beam through the electron stimulated desorption effect, the adsorption of other atoms and/or molecules is controlled at predetermined regions and/or lines on the surface.
Public/Granted literature
- US06037151A Process for the preparation of long-chain alkyl glycosides Public/Granted day:2000-03-14
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