发明授权
- 专利标题： Liquid crystal device and method for manufacturing same with spacers formed by photolithography
- 专利标题（中）： 液晶装置及其制造方法，通过光刻法形成间隔物
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申请号： US908756申请日： 1992-07-06
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公开(公告)号： US5379139A公开(公告)日： 1995-01-03
- 发明人: Masahiko Sato , Toshimitsu Konuma , Seiichi Odaka , Toshiharu Yamaguchi , Toshio Watanabe , Osamu Aoyagi , Kaoru Tabata , Chizuru Isigaki , Hiroyuki Sakayori , Ippei Kobayashi , Akio Osabe , Shunpei Yamazaki
- 申请人： Masahiko Sato , Toshimitsu Konuma , Seiichi Odaka , Toshiharu Yamaguchi , Toshio Watanabe , Osamu Aoyagi , Kaoru Tabata , Chizuru Isigaki , Hiroyuki Sakayori , Ippei Kobayashi , Akio Osabe , Shunpei Yamazaki
- 申请人地址： JPX Kanagawa
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JPX Kanagawa
- 优先权： JPX61-196424 19860820
- 主分类号： G02F1/1339
- IPC分类号： G02F1/1339
摘要：
An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of :he substrates on which electrode arrangement and active devices are formed.
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