发明授权
US5380621A Mid and deep-UV antireflection coatings and methods for use thereof
失效
中等和深紫外线抗反射涂层及其使用方法
- 专利标题： Mid and deep-UV antireflection coatings and methods for use thereof
- 专利标题（中）： 中等和深紫外线抗反射涂层及其使用方法
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申请号： US55400申请日： 1993-05-03
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公开(公告)号： US5380621A公开(公告)日： 1995-01-10
- 发明人: Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
- 申请人： Robert R. Dichiara , Christopher F. Lyons , Ratnasabapathy Sooriyakumaran , Gary T. Spinillo , Kevin M. Welsh , Robert L. Wood
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; G03F7/09 ; H01L21/027 ; H01L21/30 ; G03C1/492
摘要：
An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
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