公开(公告)号：US5380621A

公开(公告)日：1995-01-10

申请号：US55400

申请日：1993-05-03

申请人： Robert R. Dichiara ,  Christopher F. Lyons ,  Ratnasabapathy Sooriyakumaran ,  Gary T. Spinillo ,  Kevin M. Welsh ,  Robert L. Wood

发明人： Robert R. Dichiara ,  Christopher F. Lyons ,  Ratnasabapathy Sooriyakumaran ,  Gary T. Spinillo ,  Kevin M. Welsh ,  Robert L. Wood

IPC分类号： G03F7/11 ,  G03F7/09 ,  H01L21/027 ,  H01L21/30 ,  G03C1/492

CPC分类号： G03F7/091 ,  Y10S522/904

摘要： An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.

摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物（ARC），其包含对中和深紫外线辐射具有高吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且不溶于显影剂 用于化学放大光致抗蚀剂组合物。

公开(公告)号：US5482817A

公开(公告)日：1996-01-09

申请号：US315318

申请日：1994-09-29

申请人： Robert R. Dichiara ,  Christopher F. Lyons ,  Ratnasabapathy Sooriyakumaran ,  Gary T. Spinillo ,  Kevin M. Welsh ,  Robert L. Wood

发明人： Robert R. Dichiara ,  Christopher F. Lyons ,  Ratnasabapathy Sooriyakumaran ,  Gary T. Spinillo ,  Kevin M. Welsh ,  Robert L. Wood

IPC分类号： G03F7/11 ,  G03F7/09 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

CPC分类号： G03F7/091 ,  Y10S522/904

摘要： An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.

摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物（ARC），其包含对中和深紫外线辐射具有高吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且不溶于显影剂 用于化学放大光致抗蚀剂组合物。

公开(公告)号：US5554485A

公开(公告)日：1996-09-10

申请号：US315271

申请日：1994-09-29

申请人： Robert R. Dichiara ,  James T. Fahey ,  Pamela E. Jones ,  Christopher F. Lyons ,  Wayne M. Moreau ,  Ratnam Sooriyakumaran ,  Gary T. Spinillo ,  Kevin M. Welsh ,  Robert L. Wood

发明人： Robert R. Dichiara ,  James T. Fahey ,  Pamela E. Jones ,  Christopher F. Lyons ,  Wayne M. Moreau ,  Ratnam Sooriyakumaran ,  Gary T. Spinillo ,  Kevin M. Welsh ,  Robert L. Wood

IPC分类号： G03F7/11 ,  G03F7/09 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

CPC分类号： G03F7/091 ,  Y10S522/904

摘要： An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.

公开(公告)号：US5401614A

公开(公告)日：1995-03-28

申请号：US17938

申请日：1993-02-16

申请人： Robert R. Dichiara ,  James T. Fahey ,  Pamela E. Jones ,  Christopher F. Lyons ,  Wayne M. Moreau ,  Ratnam Sooriyakumaran ,  Gary T. Spinillo ,  Kevin M. Welsh ,  Robert L. Wood

发明人： Robert R. Dichiara ,  James T. Fahey ,  Pamela E. Jones ,  Christopher F. Lyons ,  Wayne M. Moreau ,  Ratnam Sooriyakumaran ,  Gary T. Spinillo ,  Kevin M. Welsh ,  Robert L. Wood

IPC分类号： G03F7/11 ,  G03F7/09 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

CPC分类号： G03F7/091 ,  Y10S522/904

摘要： An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.

摘要翻译： 一种用于化学放大光致抗蚀剂组合物的抗反射涂料组合物，其包含对中和深紫外线辐射具有高度吸收性的聚合物组合物，其对于与化学放大的光致抗蚀剂组合物的接触反应基本上是惰性的，并且其不溶于用于化学 放大的光致抗蚀剂组合物。