发明授权
- 专利标题: Exposure calculating apparatus
- 专利标题(中): 曝光计算装置
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申请号: US933819申请日: 1992-08-24
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公开(公告)号: US5392091A公开(公告)日: 1995-02-21
- 发明人: Hiroyuki Iwasaki
- 申请人: Hiroyuki Iwasaki
- 申请人地址: JPX Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-215180 19910827; JPX3-215181 19910827; JPX3-215182 19910827
- 主分类号: G03B7/099
- IPC分类号: G03B7/099 ; G03B13/02 ; G03B7/28
摘要:
An exposure calculating apparatus includes a light-metering device, consisting of a light-metering elements corresponding to elementary areas obtained by dividing a field of a focusing optical system, for measuring a light intensity distribution in the field, a position of object detecting means for detecting a position of object in the field, a classifying means for changing a divisional pattern of light-metering areas in correspondence with the position of object, and classifying the light-metering elements of the light-metering device into a plurality of groups according to the divisional pattern, and a calculating device for calculating an exposure value by weighting the outputs from the plurality of light-metering elements in correspondence with the groups to which the light-metering elements belong, and supplying the exposure value to exposure control.