Negative photoresists, and electronic devices comprising dielectric polyimide films resulting from such photoresists. The Photoresists comprise polyamic acids, which have been neutralized with tertiary amines containing double bonds of the acrylic family, the amines including acrylamines, alkylacrylamines such as for example methacrylamines, ethacrylamines, and the like. Also methods of making such amines in high purity.