Negative photoresists containing aminoacrylate salts
    5.
    发明授权
    Negative photoresists containing aminoacrylate salts 失效
    含有氨基丙烯酸盐的负性光致抗蚀剂

    公开(公告)号:US5399460A

    公开(公告)日:1995-03-21

    申请号:US803311

    申请日:1991-12-04

    IPC分类号: G03F7/038 G03C1/73

    CPC分类号: G03F7/0387

    摘要: Negative photoresists, and electronic devices comprising dielectric polyimide films resulting from such photoresists. The Photoresists comprise polyamic acids, which have been neutralized with tertiary amines containing double bonds of the acrylic family, the amines including acrylamines, alkylacrylamines such as for example methacrylamines, ethacrylamines, and the like. Also methods of making such amines in high purity.

    摘要翻译: 负型光致抗蚀剂以及包含由这种光刻胶产生的电介质聚酰亚胺膜的电子器件。 光致抗蚀剂包括聚酰胺酸,其已经被含有丙烯酸类家族双键的叔胺中和,胺包括丙烯酰胺,烷基丙烯酰胺如甲基丙烯酰胺,乙基丙烯酸胺等。 也是制备高纯度胺的方法。