Invention Grant
- Patent Title: Scan and tilt apparatus for an ion implanter
- Patent Title (中): 用于离子注入机的扫描和倾斜装置
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Application No.: US172441Application Date: 1993-12-22
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Publication No.: US5406088APublication Date: 1995-04-11
- Inventor: Robert A. Brune , Andrew M. Ray
- Applicant: Robert A. Brune , Andrew M. Ray
- Applicant Address: OH Cleveland
- Assignee: Eaton Corporation
- Current Assignee: Eaton Corporation
- Current Assignee Address: OH Cleveland
- Main IPC: C23C14/48
- IPC: C23C14/48 ; B25J9/04 ; H01J37/20 ; H01J37/317 ; H01L21/265 ; H01L21/68
Abstract:
An improved scan and tilt apparatus for an ion implanter wherein a wafer-receiving platen assembly is received on the end member of a multiple axis arm system which is operable to effect scanning motion of the wafer along a straight line which intercepts the wafer tilt axis in any tilt position of the platen assembly. The arm system includes a rail and linear bearing system which interconnects an input member with the end member of the arm system to restrict the scanning motion to a straight line.
Public/Granted literature
- US6110773A Static random access memory device manufacturing method Public/Granted day:2000-08-29
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