发明授权
US5447614A Method of processing a sample using a charged beam and reactive gases
and system employing the same
失效
使用带电束和反应性气体处理样品的方法及采用该方法的系统
- 专利标题： Method of processing a sample using a charged beam and reactive gases and system employing the same
- 专利标题（中）： 使用带电束和反应性气体处理样品的方法及采用该方法的系统
-
申请号： US260907申请日： 1994-06-15
-
公开(公告)号： US5447614A公开(公告)日： 1995-09-05
- 发明人: Yuuichi Hamamura , Satoshi Haraichi , Akira Shimase , Junzou Azuma , Fumikazu Itoh , Toshio Yamada , Yasuhiro Koizumi , Michinobu Mizumura
- 申请人： Yuuichi Hamamura , Satoshi Haraichi , Akira Shimase , Junzou Azuma , Fumikazu Itoh , Toshio Yamada , Yasuhiro Koizumi , Michinobu Mizumura
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-076590 19920331
- 主分类号： H01J37/244
- IPC分类号： H01J37/244 ; H01J37/317 ; C23C14/46 ; B23K15/00
摘要：
A method of processing a sample using a charged beam and reactive gases and a system employing the same, the method and system being able to perform the reactive etching and the beam assisted deposition using a charged particle detector free from the degradation of the performance due to the reactive gas. The system is designed in such a way that a shutter mechanism is provided in the form of the charged particle detector, and a chamber for accommodating the charged particle detector can be evacuated. In the observation of the sample, the charged particle detector is turned on to open the shutter mechanism, and in the processing of the sample, the charged particle detector is turned off or left as it is to shut the shutter mechanism to evacuate the inside of the charged particle detector.
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