发明授权
- 专利标题: Heterojunction bipolar transistor with graded base doping
- 专利标题(中): 异质结双极晶体管,具有分级基极掺杂
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申请号: US876199申请日: 1992-04-30
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公开(公告)号: US5448087A公开(公告)日: 1995-09-05
- 发明人: Swight C. Streit , Aaron K. Oki
- 申请人: Swight C. Streit , Aaron K. Oki
- 申请人地址: CA Redondo Beach
- 专利权人: TRW Inc.
- 当前专利权人: TRW Inc.
- 当前专利权人地址: CA Redondo Beach
- 主分类号: H01L29/10
- IPC分类号: H01L29/10 ; H01L29/737 ; H01L29/161 ; H01L29/205 ; H01L29/225
摘要:
A heterojunction bipolar transistor with an exponentially graded base doping is disclosed, in addition to a technique for fabricating the transistor. In accordance with the preferred embodiment, the transistor employs a base with an exponentially graded Beryllium doping which varies from 5.times.10.sup.19 cm.sup.-3 at the base-emitter junction to 5.times.10.sup.18 cm.sup.-3 at the base-collector junction. The built-in field due to the exponentially graded doping profile significantly reduces base transit time despite bandgap narrowing associated with high base doping. Compared to devices with the same base thickness and uniform base doping, the cut off frequency is increased and the maximum frequency of oscillation is also increased. Also, consistently higher common emitter current gain results even though the Gummel number is twice as high and the base resistance is reduced by 40%.
公开/授权文献
- US5953198A Electromagnetic drive apparatus 公开/授权日:1999-09-14
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