Invention Grant
- Patent Title: Radiation-sensitive polymers and positive-working recording materials
- Patent Title (中): 辐射敏感聚合物和正性录音材料
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Application No.: US273620Application Date: 1994-07-12
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Publication No.: US5453341APublication Date: 1995-09-26
- Inventor: Reinhold Schwalm
- Applicant: Reinhold Schwalm
- Assignee: Schwalm; Reinhold
- Current Assignee: Schwalm; Reinhold
- Priority: DEX3914407.0 19890429
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/035 ; B32B3/10
Abstract:
Radiation-sensitive polymers contain, in the polymer main chain, both acid-labile groups and onium salt groups with nonnucleophilic counterions and are suitable for the production of semiconductor structural elements.
Public/Granted literature
- US6146475A Free-machining martensitic stainless steel Public/Granted day:2000-11-14
Information query
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