发明授权
- 专利标题: Light quantity controlling apparatus
- 专利标题(中): 光量控制装置
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申请号: US291747申请日: 1994-08-17
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公开(公告)号: US5459573A公开(公告)日: 1995-10-17
- 发明人: Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
- 申请人: Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX63-218523 19880902
- 主分类号: G01B11/00
- IPC分类号: G01B11/00 ; G01D5/26 ; G03F9/00 ; H01L21/68 ; H01L31/12 ; H01L33/00 ; H01S5/06 ; H01S5/062 ; H01S5/0683 ; G01N21/86
摘要:
A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.
公开/授权文献
- US6038889A Cooling system for a glassware machine 公开/授权日:2000-03-21
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