发明授权
- 专利标题： Thermal development diazo copying material
- 专利标题（中）： 热开发重氮复制材料
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申请号： US199024申请日： 1994-02-18
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公开(公告)号： US5478689A公开(公告)日： 1995-12-26
- 发明人: Masanori Rimoto , Shigeru Kusakata
- 申请人： Masanori Rimoto , Shigeru Kusakata
- 申请人地址： JPX Tokyo
- 专利权人： Ricoh Company, Ltd.
- 当前专利权人： Ricoh Company, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX5-054828 19930219; JPX5-101941 19930405; JPX5-256462 19930920
- 主分类号： B41M5/323
- IPC分类号： B41M5/323 ; B41M5/28 ; B41M5/30 ; G03C1/00 ; G03C1/52 ; G03C1/60 ; G03C1/61 ; G03C1/72
摘要：
A thermal development diazo copying material is composed of a support, and a photosensitive layer formed thereon, which includes a diazo compound, a coupler, an alkali-soluble resin, and a sensitizer, with only the coupler being contained in microcapsules made of the alkali-soluble resin.