发明授权
- 专利标题: Method for manufacturing three-terminal oxide superconducting devices
- 专利标题(中): 制造三端氧化物超导器件的方法
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申请号: US354048申请日: 1994-12-06
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公开(公告)号: US5494891A公开(公告)日: 1996-02-27
- 发明人: Takao Nakamura , Michitomo Iiyama
- 申请人: Takao Nakamura , Michitomo Iiyama
- 申请人地址: JPX Osaka
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX3-342467 19911130; JPX3-342468 19911130; JPX3-342469 19911130; JPX3-342470 19911130
- 主分类号: H01L39/14
- IPC分类号: H01L39/14 ; H01L39/24 ; H01B12/00
摘要:
A superconducting device comprises a substrate, a non-superconducting layer formed in a principal surface of said substrate, an extremely thin superconducting channel formed of an oxide superconductor thin film on the non-superconducting layer. A superconducting source region and a superconducting drain region of a relatively thick thickness are formed of the oxide superconductor at the both sides of the superconducting channel separated from each other but electrically connected through the superconducting channel, so that a superconducting current can flow through the superconducting channel between the superconducting source region and the superconducting drain region. The superconducting device further includes a gate electrode through a gate insulator on the superconducting channel for controlling the superconducting current flowing through the superconducting channel, in which the superconducting channel is connected to the superconducting source region and the superconducting drain region at the higher portions than their one third height portions.
公开/授权文献
- US4951800A Coin validator 公开/授权日:1990-08-28
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