发明授权
- 专利标题： Method of polishing/flattening diamond
- 专利标题（中）： 抛光/平整钻石的方法
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申请号： US208169申请日： 1994-03-08
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公开(公告)号： US5500077A公开(公告)日： 1996-03-19
- 发明人: Yoshiki Nishibayashi , Shinichi Shikata
- 申请人： Yoshiki Nishibayashi , Shinichi Shikata
- 申请人地址： JPX
- 专利权人： Sumitomo Electric Industries, Ltd.
- 当前专利权人： Sumitomo Electric Industries, Ltd.
- 当前专利权人地址： JPX
- 优先权： JPX5-049198 19930310; JPX5-127230 19930528
- 主分类号： C30B33/00
- IPC分类号： C30B33/00 ; B44C1/22
摘要：
A method of flattening diamond, including: forming a flat coating comprising a material different from diamond, on a surface of diamond having unevenness; and removing the coating and the unevenness of the surface of diamond by dry etching under a condition such that both of the coating and the diamond can be etched, thereby to smooth the surface of the diamond.