发明授权
US5530282A Semiconductor device having a multilayer interconnection structure 失效
具有多层互连结构的半导体器件

  • 专利标题: Semiconductor device having a multilayer interconnection structure
  • 专利标题(中): 具有多层互连结构的半导体器件
  • 申请号: US513253
    申请日: 1995-08-10
  • 公开(公告)号: US5530282A
    公开(公告)日: 1996-06-25
  • 发明人: Masahiro Tsuji
  • 申请人: Masahiro Tsuji
  • 申请人地址: JPX Kyoto
  • 专利权人: Rohm Co., Ltd.
  • 当前专利权人: Rohm Co., Ltd.
  • 当前专利权人地址: JPX Kyoto
  • 优先权: JPX5-114063 19930415
  • 主分类号: H01L23/50
  • IPC分类号: H01L23/50 H01L23/495 H01L23/48
Semiconductor device having a multilayer interconnection structure
摘要:
A semiconductor device having a increased freedom of design in the connection between an electrode and one or more inner leads. In a semiconductor device 2, a semiconductor element 4 is fixed onto a die pad 2 which is a part of a lead frame. On the surface of the semiconductor element 4 is formed an electrode (bonding pad) 5, which is electrically connected to an inner lead 3 through a bridge structure 10 comprising an insulating film 11 deposited at a lowermost position and a conductive thin film pattern 12 formed thereon.
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