发明授权
- 专利标题: Apparatus for uniform cleaning of wafers using megasonic energy
- 专利标题(中): 使用兆声波能量均匀清洁晶片的装置
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申请号: US370714申请日: 1995-01-10
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公开(公告)号: US5533540A公开(公告)日: 1996-07-09
- 发明人: David Stanasolovich , William A. Syverson , Ronald A. Warren
- 申请人: David Stanasolovich , William A. Syverson , Ronald A. Warren
- 申请人地址: NY Armonk
- 专利权人: Inernational Business Machines Corporation
- 当前专利权人: Inernational Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: E04B1/84
- IPC分类号: E04B1/84 ; H01L21/00 ; B08B3/10
摘要:
Apparatus and method for cleaning/etching the surface of an article with sonic energy in the megahertz range which employ an anti-reflection mechanism within a recirculation tank. A tank having at least one side wall and a bottom structure holds a cleaning/etching liquid and a megasonic transducer is associated with the tank for projecting megasonic energy into the liquid. The anti-reflection mechanism is disposed within the tank in close association with the at least one sidewall or bottom structure of the tank to thereby minimize reflection of megasonic energy from the associated surface. Preferably, the megasonic transducer is associated with a first tank sidewall which opposes a second tank sidewall, and the anti-reflection mechanism is disposed adjacent the second tank sidewall. By way of example, the anti-reflection mechanism can comprise a stream of gas bubbles, a plurality of anechoic structures, or a combination of both gas bubbles and anechoic structures.
公开/授权文献
- US6164270A Exhaust gas recirculation fault detection system 公开/授权日:2000-12-26
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