发明授权
- 专利标题： Substrate reclaim method
- 专利标题（中）： 基材回收方法
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申请号： US376884申请日： 1995-01-23
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公开(公告)号： US5562840A公开(公告)日： 1996-10-08
- 发明人: Eugene A. Swain , Peter J. Schmitt , Alfred O. Klein , John J. Wilbert
- 申请人： Eugene A. Swain , Peter J. Schmitt , Alfred O. Klein , John J. Wilbert
- 申请人地址： CT Stamford
- 专利权人： Xerox Corporation
- 当前专利权人： Xerox Corporation
- 当前专利权人地址： CT Stamford
- 主分类号： B08B7/00
- IPC分类号： B08B7/00 ; B23K26/36 ; G03G5/10 ; B08B5/00
摘要：
There is disclosed a substrate reclaim method comprising directing laser energy at a coating covering a part of an outer surface of a substrate, wherein the outer surface has a shiny finish, thereby removing with the laser energy all of the coating on the outer surface and etching with the laser energy a portion of the outer surface to change the etched outer surface portion from a shiny finish to a matte finish.
公开/授权文献
- US4476542A Printing system 公开/授权日：1984-10-09
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