发明授权
- 专利标题: Semiconductor integrated circuit device and process for fabricating the same
- 专利标题(中): 半导体集成电路器件及其制造方法
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申请号: US459961申请日: 1995-06-02
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公开(公告)号: US5572480A公开(公告)日: 1996-11-05
- 发明人: Shuji Ikeda , Satoshi Meguro , Soichiro Hashiba , Isamu Kuramoto , Atsuyoshi Koike , Katsuro Sasaki , Koichiro Ishibashi , Toshiaki Yamanaka , Naotaka Hashimoto , Nobuyuki Moriwaki , Shigeru Takahashi , Atsushi Hiraishi , Yutaka Kobayashi , Seigou Yukutake
- 申请人: Shuji Ikeda , Satoshi Meguro , Soichiro Hashiba , Isamu Kuramoto , Atsuyoshi Koike , Katsuro Sasaki , Koichiro Ishibashi , Toshiaki Yamanaka , Naotaka Hashimoto , Nobuyuki Moriwaki , Shigeru Takahashi , Atsushi Hiraishi , Yutaka Kobayashi , Seigou Yukutake
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi Ltd.
- 当前专利权人: Hitachi Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX2-30451 19900209; JPX2-30452 19900209; JPX2-30454 19900209; JPX2-30458 19900209; JPX2-49312 19900302
- 主分类号: H01L27/11
- IPC分类号: H01L27/11 ; G11C8/00
摘要:
Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.
公开/授权文献
- US5020191A Snorkel strap 公开/授权日:1991-06-04
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