发明授权
- 专利标题： Apparatus and method for manufacturing semiconductors
- 专利标题（中）： 半导体制造装置及方法
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申请号： US332498申请日： 1994-10-31
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公开(公告)号： US5579084A公开(公告)日： 1996-11-26
- 发明人: Kazuo Takahashi , Mitsuru Inoue
- 申请人： Kazuo Takahashi , Mitsuru Inoue
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX4-070071 19920221
- 主分类号： F16F9/53
- IPC分类号： F16F9/53 ; F16F15/00 ; F16F15/027 ; G03F7/20 ; H01L21/027 ; H01L21/30 ; H01L21/67 ; G03B27/42
摘要：
A semiconductor manufacturing apparatus having a vibration insulation apparatus with a damper for insulating floor vibrations is so designed that damping characteristics of a damper can be changed. Thus, a semiconductor manufacturing apparatus capable of preventing floor vibrations from being transmitted to the apparatus and efficiently attenuating vibrations generated by the apparatus can be provided.
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