发明授权
US5593839A Computer-aided engineering system for design of sequence arrays and
lithographic masks
失效
用于设计序列阵列和光刻掩模的计算机辅助工程系统
- 专利标题： Computer-aided engineering system for design of sequence arrays and lithographic masks
- 专利标题（中）： 用于设计序列阵列和光刻掩模的计算机辅助工程系统
-
申请号： US460411申请日： 1995-06-02
-
公开(公告)号： US5593839A公开(公告)日： 1997-01-14
- 发明人: Earl A. Hubbell , Robert J. Lipshutz , Macdonald S. Morris , James L. Winkler
- 申请人： Earl A. Hubbell , Robert J. Lipshutz , Macdonald S. Morris , James L. Winkler
- 申请人地址： CA Santa Clara
- 专利权人： Affymetrix, Inc.
- 当前专利权人： Affymetrix, Inc.
- 当前专利权人地址： CA Santa Clara
- 主分类号： B01J19/00
- IPC分类号： B01J19/00 ; C07B61/00 ; C07K1/04 ; C40B40/06 ; C40B60/14 ; G03F1/00 ; C12Q1/68 ; C07H21/04 ; G03F9/00
摘要：
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.
公开/授权文献
信息查询
