发明授权
US5599654A Process for forming patterned layer of fluorinated resin and devices
containing same
失效
用于形成氟化树脂的图案层的方法和包含其的装置
- 专利标题: Process for forming patterned layer of fluorinated resin and devices containing same
- 专利标题(中): 用于形成氟化树脂的图案层的方法和包含其的装置
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申请号: US107167申请日: 1993-08-17
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公开(公告)号: US5599654A公开(公告)日: 1997-02-04
- 发明人: Hiroshi Kudo
- 申请人: Hiroshi Kudo
- 申请人地址: JPX Kanagawa
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX4-222893 19920821
- 主分类号: C23C14/16
- IPC分类号: C23C14/16 ; C23C14/06 ; G03F7/004 ; G03F7/038 ; G03F7/09 ; G03F7/16 ; G03F7/38 ; G03F7/40 ; H01L21/027 ; H01L21/312 ; H01L21/768 ; H01L23/522
摘要:
A resin or amorphous carbon layer is coated on a substrate and then fluorinated by exposing it in a F.sub.2 gas atmosphere. The thus fluorinated resin or amorphous carbon layer can be excellent in dielectric constant and thermal resistance. The resin may be photo-sensitive so that the resin can be patterned before the fluorination. Alternatively, the resin can be fluorinated before patterning.
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