发明授权
- 专利标题: X-ray exposure method and apparatus and device manufacturing method
- 专利标题(中): X射线曝光方法及装置和装置制造方法
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申请号: US678784申请日: 1996-07-11
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公开(公告)号: US5606586A公开(公告)日: 1997-02-25
- 发明人: Mitsuaki Amemiya , Yasuaki Fukuda , Yutaka Watanabe , Akira Miyake
- 申请人: Mitsuaki Amemiya , Yasuaki Fukuda , Yutaka Watanabe , Akira Miyake
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX4-270973 19920914; JPX5-159495 19930629; JPX5-161789 19930630
- 主分类号: B29C35/08
- IPC分类号: B29C35/08 ; G03F7/20 ; G21K5/00
摘要:
An exposure method using X-rays from a synchrotron radiation source includes determining a relationship between an X-ray intensity distribution and an exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.