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公开(公告)号：US5606586A
公开(公告)日：1997-02-25
申请号：US678784
申请日：1996-07-11
CPC分类号： G03F7/70075 , G03F7/2039 , G03F7/702 , B29C2035/0844
摘要： An exposure method using X-rays from a synchrotron radiation source includes determining a relationship between an X-ray intensity distribution and an exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.
摘要翻译： 使用来自同步加速器辐射源的X射线的曝光方法包括确定曝光区域中的X射线强度分布与曝光量分布之间的关系; 以及通过使用关系控制曝光区域中的各个位置的剂量量来进行曝光操作，其中通过改变用于控制曝光操作的活动快门的驱动轮廓来控制剂量，并且其中的关系为 作为曝光区域中的位置信息的函数的X射线强度与曝光量之间的比例系数。
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公开(公告)号：US5159621A
公开(公告)日：1992-10-27
申请号：US739259
申请日：1991-08-01
申请人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
发明人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
CPC分类号： G21K5/04 , H01J2235/18
摘要： An X-ray transmitting window for use in X-ray lithography, for allowing transmission therethrough of X-rays from a vacuum ambience to a different ambience, includes an X-ray transmitting film, and a gasket material gas-tightly provided on at least one of opposite surfaces in a peripheral portion of the X-ray transmitting film. The gasket material has a Brinell hardness smaller than that of the X-ray transmitting film. The formed X-ray transmitting window is able to be sandwiched and fastened between a pair of flanges in a gas-tight manner.
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公开(公告)号：US5101420A
公开(公告)日：1992-03-31
申请号：US689092
申请日：1991-04-22
申请人： Nobuo Kushibiki , Hideo Kato , Akira Miyake , Yasuaki Fukuda
发明人： Nobuo Kushibiki , Hideo Kato , Akira Miyake , Yasuaki Fukuda
CPC分类号： G03F1/22 , G03F7/707 , G03F7/70858 , G03F7/70891
摘要： An X-ray mask support comprises a support frame and a support film, wherein both of the support frame and the support film have a thermal expansion coefficient of not more than 1.times.10.sup.-5 K.sup.-1 or wherein the thermal expansion coefficient of the support film does not exceed that of the support flame or wherein both the support frame and the support film have a thermal expansion coefficient of not more than 1.times.10.sup.-5 K.sup.-1 and the support film has a surface roughness at least on the mask surface, of not more than 10 nm r.m.s. Basically a process for preparing the X-ray support film comprises the steps of forming a film on a substrate and sintering the film.
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4.发明授权Production method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structure 失效x射线掩模结构的制造方法，由此制造的x射线掩模结构，以及使用X射线掩模结构
公开(公告)号：US5469489A
公开(公告)日：1995-11-21
申请号：US413930
申请日：1995-03-30
申请人： Akira Miyake , Yasuaki Fukuda , Hiroshi Maehara
发明人： Akira Miyake , Yasuaki Fukuda , Hiroshi Maehara
IPC分类号： G03F1/22 , H01L21/027 , H01L39/00
CPC分类号： G03F1/22
摘要： The present invention provides a simple and easy processing method for producing an X-ray mask structure having an X-ray absorber whose side walls have waviness. More specifically, in accordance with the present invention, the method for producing an X-ray mask structure which comprises an X-ray absorber, an X-ray transmissive membrane for supporting the X-ray absorber, and a supporting frame for supporting the X-ray transmissive membrane, includes a step of forming the X-ray absorber by depositing an X-ray absorber material in the regions between resist patterns, the above resist patterns having waviness on the side walls of the resist patterns.
摘要翻译： 本发明提供了一种用于制造具有侧壁具有波纹的X射线吸收体的X射线掩模结构的简单且容易的加工方法。 更具体地，根据本发明，用于制造X射线掩模结构的方法包括X射线吸收体，用于支撑X射线吸收体的X射线透过膜，以及支撑X 射线透射膜包括通过在抗蚀剂图案之间的区域中沉积X射线吸收材料来形成X射线吸收体的步骤，上述抗蚀剂图案在抗蚀剂图案的侧壁上具有波纹。
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5.发明授权
公开(公告)号：US5433988A
公开(公告)日：1995-07-18
申请号：US323592
申请日：1994-10-17
CPC分类号： B32B15/08 , B82Y10/00 , G02B5/0833 , G02B5/0891 , G02B5/26 , G21K1/062 , G21K2201/061 , Y10S428/913 , Y10T428/24355 , Y10T428/30
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layers primarily consists of at least one of single elements, such as ruthenium, or of a boride carbide, silicate, nitride oxide of a transition metal. The second layers primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译： 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素中的至少一种组成，例如钌，或硼化物碳化物，硅酸盐，过渡金属的氮氧化物。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。
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公开(公告)号：US5182763A
公开(公告)日：1993-01-26
申请号：US888275
申请日：1992-05-26
申请人： Takashi Iizuka , Yutaka Watanabe , Yasuaki Fukuda
发明人： Takashi Iizuka , Yutaka Watanabe , Yasuaki Fukuda
CPC分类号： G21K1/062 , B82Y10/00 , G02B26/10 , G02B5/0891 , G03F7/70058 , G03F7/70958 , G21K2201/061 , G21K2201/064
摘要： Disclosed are a reflection mirror for reflecting a received radiation beam to produce a reflection beam, a reflection device with such a mirror, a scanning system with such a mirror and an exposure apparatus with such a mirror. A radiation beam is inputted to the reflection mirror with an angle of incidence which changes with position on the reflection mirror, wherein the reflection mirror has a multilayered film effective to provide an increased relative reflectivity with respect to a predetermined wavelength of the reflection beam, and wherein a layer of the multilayered film has a thickness which changes with position so as to substantially avoid a shift of the wavelength of the reflection beam dependent upon the angle of incidence.
摘要翻译： 公开了一种用于反射接收的辐射束以产生反射光束的反射镜，具有这种反射镜的反射装置，具有这种反射镜的扫描系统和具有这种反射镜的曝光装置。 辐射束以反射镜上的位置随着入射角被输入到反射镜，其中反射镜具有有效地相对于反射光束的预定波长提供增加的相对反射率的多层膜，以及 其中所述多层膜的层具有随位置而变化的厚度，以便基本上避免所述反射光束的波长相对于所述入射角的偏移。
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公开(公告)号：US5123036A
公开(公告)日：1992-06-16
申请号：US735691
申请日：1991-07-22
CPC分类号： G03F7/702 , G21K1/06 , G21K2201/064
摘要： An X-ray exposure apparatus for exposing a resist on a substrate to a pattern of an original includes a radiation source for providing X-rays; and an illumination system for irradiating the original and the substrate with the X-rays such that the resist of the substrate is exposed to the pattern of the original with the X-rays; wherein the illumination system has a convex mirror having a reflection surface of a shape like a cylindrical surface, for reflecting the X-rays from the radiation source to the original; and wherein the reflection surface of the mirror has such an aspherical surface shape that, with respect to a top of the reflection surface, a radiation source side and an original side are asymmetrical in shape, that, in the neighborood of the top, the radiation source side has a radius of curvature smaller than that of the original side, and that at a peripheral potion the reflection surface has a curvature of a radius larger than that at the top of the reflection surface.
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公开(公告)号：US5335259A
公开(公告)日：1994-08-02
申请号：US15434
申请日：1993-02-09
IPC分类号： G03F7/20 , G21K1/10 , H01L21/027 , G21K1/00
CPC分类号： G03F7/70808 , G21K1/10
摘要： An X-ray apparatus includes an X-ray pickup window through which synchrotron radiation light is projected, the X-ray pickup window having an X-ray transmission film; and a correcting system for correcting an intensity distribution of the synchrotron radiation light; wherein the X-ray transmission film has at least one of a film thickness distribution and a transmissivity distribution changing substantially in a predetermined direction; and wherein the X-ray transmission film is so disposed that the predetermined direction is substantially aligned with the direction of change of the intensity distribution of the synchrotron radiation light.
摘要翻译： X射线装置包括X射线拾取窗口，X射线拾取窗口通过其投影同步加速器辐射光，X射线拾取窗口具有X射线透射膜; 以及用于校正同步加速器辐射光的强度分布的校正系统; 其中所述X射线透射膜具有基本上沿预定方向改变的膜厚度分布和透射率分布中的至少一个; 并且其中所述X射线透射膜被设置成使得所述预定方向基本上与所述同步加速器辐射光的强度分布的变化方向对准。
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9.发明授权
公开(公告)号：US5310603A
公开(公告)日：1994-05-10
申请号：US75350
申请日：1993-06-14
CPC分类号： G21K1/062 , B32B15/08 , B82Y10/00 , G02B5/0891 , G02B5/26 , G21K2201/061 , Y10S428/913
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layer primarily consists of at least one of single elements, such as ruthenium or of a boride, carbide, silicide, nitride oxide of a transition metal. The second layer primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译： 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素，例如钌或硼化物，碳化物，硅化物，过渡金属的氮氧化物中的至少一种组成。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。
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10.发明授权X-ray mask support member, X-ray mask, and X-ray exposure process using the X-ray mask 失效X射线掩模支撑构件，X射线掩模和使用X射线掩模的X射线曝光处理
公开(公告)号：US5012500A
公开(公告)日：1991-04-30
申请号：US290624
申请日：1988-12-27
申请人： Yutaka Watanabe , Yasuaki Fukuda , Shigetaro Ogura
发明人： Yutaka Watanabe , Yasuaki Fukuda , Shigetaro Ogura
IPC分类号： G03F1/22
CPC分类号： G03F1/22
摘要： An X-ray mask support member comprises a support frame, and a support membrane which is held thereon and comprises X-ray-transmissive membranes laminated in multiple layers. The support membrane comprises and holds between the multi-layers at least one layer of a transmissive membrane T having an electrical resistivity of 1.times.10.sup.-4 .OMEGA..multidot.cm or less.
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