发明授权
US5627136A Pyridine-N-oxide-substituted salicylaldehyde or salicyclic acid
derivatives, their preparation and their use as herbicides
失效
吡啶-N-氧化物取代的水杨醛或水杨酸衍生物,其制备及其作为除草剂的用途
- 专利标题: Pyridine-N-oxide-substituted salicylaldehyde or salicyclic acid derivatives, their preparation and their use as herbicides
- 专利标题(中): 吡啶-N-氧化物取代的水杨醛或水杨酸衍生物,其制备及其作为除草剂的用途
-
申请号: US332037申请日: 1994-11-01
-
公开(公告)号: US5627136A公开(公告)日: 1997-05-06
- 发明人: Joachim Rheinheimer , Uwe J. Vogelbacher , Ernst Baumann , Matthias Gerber , Karl-Otto Westphalen , Helmut Walter
- 申请人: Joachim Rheinheimer , Uwe J. Vogelbacher , Ernst Baumann , Matthias Gerber , Karl-Otto Westphalen , Helmut Walter
- 申请人地址: DEX Ludwigshafen
- 专利权人: BASF Aktiengesellschaft
- 当前专利权人: BASF Aktiengesellschaft
- 当前专利权人地址: DEX Ludwigshafen
- 优先权: DEX4337322.4 19931102
- 主分类号: A01N43/54
- IPC分类号: A01N43/54 ; A01N43/66 ; C07D213/89 ; C07D401/12 ; C07D405/04 ; C07D411/04 ; C07D491/04 ; C07D491/048 ; C07D521/00 ; C07D239/32 ; C07D239/46 ; C07D401/10
摘要:
Pyridine-N-oxide-substituted salicylaldehyde and salicylic acid derivatives of the general formula I ##STR1## where R is a formyl group, a CO.sub.2 H group or a radical which can be hydrolyzed to CO.sub.2 H and the other substituents have the following meanings:R.sup.2 is halogen, alkyl, haloalkyl, alkoxy, haloalkoxy or alkylthio;X is nitrogen or CR.sup.13, R.sup.13 being hydrogen or halogen or together with R.sup.3 forming a 3- to 4-membered alkylene or alkenylene chain in which at least one methylene group is replaced by oxygen;R.sup.3 is halogen, alkyl, haloalkyl, alkoxy, haloalkoxy or alkylthio, or R.sup.3 is linked with R.sup.13 as indicated above to give a 5- or 6-membered ring;Y is oxygen or sulfur;R.sup.14 -R.sup.17 are an unsubstituted or alkyl-substituted cycloalkyl group; an unsubstituted or substituted alkyl group; an unsubstituted or substituted alkoxy or alkylthio group; a dialkylamino group or a dialkylaminoxy group; an unsubstituted or substituted alkenyl or alkynyl group, hydrogen, halogen, nitro or cyano,are described.
公开/授权文献
- US4422885A Polysilicon-doped-first CMOS process 公开/授权日:1983-12-27