发明授权
- 专利标题： Image projection method and semiconductor device manufacturing method using the same
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申请号： US483866申请日： 1995-06-07
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公开(公告)号： US5631773A公开(公告)日： 1997-05-20
- 发明人: Akiyoshi Suzuki
- 申请人： Akiyoshi Suzuki
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX3-194132 19910802
- 主分类号： G02B27/42
- IPC分类号： G02B27/42 ; G02B27/46 ; G02B27/52 ; G03F7/20 ; H01L21/027 ; G02B5/18 ; G03B27/42 ; G03B27/54
摘要：
An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.
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