发明授权
- 专利标题: Method of producing a semiconductor device for a light valve
- 专利标题(中): 制造光阀半导体装置的方法
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申请号: US463687申请日: 1995-06-05
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公开(公告)号: US5633176A公开(公告)日: 1997-05-27
- 发明人: Hiroaki Takasu , Yoshikazu Kojima , Kunihiro Takahashi , Tsuneo Yamazaki , Tadao Iwaki
- 申请人: Hiroaki Takasu , Yoshikazu Kojima , Kunihiro Takahashi , Tsuneo Yamazaki , Tadao Iwaki
- 申请人地址: JPX
- 专利权人: Seiko Instruments Inc.
- 当前专利权人: Seiko Instruments Inc.
- 当前专利权人地址: JPX
- 优先权: JPX4-220504 19920819
- 主分类号: G02F1/1362
- IPC分类号: G02F1/1362 ; H01L27/12 ; H01L21/84 ; H01L21/304
摘要:
A semiconductor substrate is utilized to integrally form a drive circuit and a pixel array to produce a transparent semiconductor device for a light valve comprising a pixel array region and a drive circuit region on a major face of the semiconductor substrate. A stopper film is formed on the major face of the semiconductor substrate at the pixel array region, and a pixel array is formed over the silicon oxide stopper film. A drive circuit is formed on the drive circuit region, and silicon oxide posts are embedded in the major face of the semiconductor substrate at the drive circuit region. A thickness of the semiconductor substrate is then selectively removed from a back face opposite to the major face thereof to reach the stopper film. After the selective removing step, the portion of the semiconductor substrate under the pixel region is completely removed while a portion of the semiconductor substrate under the drive circuit region remains.
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