Invention Grant
- Patent Title: Stage movement control apparatus and method therefor and projection exposure apparatus and method therefor
- Patent Title (中): 舞台运动控制装置及其方法和投影曝光装置及其方法
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Application No.: US587759Application Date: 1995-11-22
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Publication No.: US5633720APublication Date: 1997-05-27
- Inventor: Masato Takahashi
- Applicant: Masato Takahashi
- Applicant Address: JPX Toyko
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JPX Toyko
- Priority: JPX6-294723 19941129
- Main IPC: H01L21/027
- IPC: H01L21/027 ; G01B11/00 ; G03F7/20 ; G03F9/00 ; G05D3/12 ; G12B5/00
Abstract:
When a stage moves, the position of the stage is detected by an interferometer, and a control unit controls the position of the stage while monitoring the output of the interferometer. Thus, the control unit effects positioning of the stage. In addition, the control unit calculates the square root of an arithmetic mean of the square of an error between target and present positions of the stage on the basis of the output of the interferometer, and estimates an amount of vibration of the stage on the basis of the result of the calculation, thereby enabling vibration characteristics to be quantitatively evaluated to a certain extent when the damping of vibration is rapid immediately after positioning, or when the damping is gentle or almost zero.
Public/Granted literature
- US4659601A Adjustable multilayer thermal mirror insulation Public/Granted day:1987-04-21
Information query
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