发明授权
- 专利标题： Stage movement control apparatus and method therefor and projection exposure apparatus and method therefor
- 专利标题（中）： 舞台运动控制装置及其方法和投影曝光装置及其方法
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申请号： US587759申请日： 1995-11-22
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公开(公告)号： US5633720A公开(公告)日： 1997-05-27
- 发明人: Masato Takahashi
- 申请人： Masato Takahashi
- 申请人地址： JPX Toyko
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JPX Toyko
- 优先权： JPX6-294723 19941129
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G01B11/00 ; G03F7/20 ; G03F9/00 ; G05D3/12 ; G12B5/00
摘要：
When a stage moves, the position of the stage is detected by an interferometer, and a control unit controls the position of the stage while monitoring the output of the interferometer. Thus, the control unit effects positioning of the stage. In addition, the control unit calculates the square root of an arithmetic mean of the square of an error between target and present positions of the stage on the basis of the output of the interferometer, and estimates an amount of vibration of the stage on the basis of the result of the calculation, thereby enabling vibration characteristics to be quantitatively evaluated to a certain extent when the damping of vibration is rapid immediately after positioning, or when the damping is gentle or almost zero.
公开/授权文献
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