发明授权
- 专利标题： Lithographic mask and exposure apparatus using the same
- 专利标题（中）： 平版印刷掩模和使用其的曝光装置
-
申请号： US592607申请日： 1996-01-26
-
公开(公告)号： US5641593A公开(公告)日： 1997-06-24
- 发明人: Yutaka Watanabe , Masami Hayashida
- 申请人： Yutaka Watanabe , Masami Hayashida
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX5-258085 19931015
- 主分类号： G03F1/22
- IPC分类号： G03F1/22 ; G03F1/24 ; G03F1/32 ; G03F1/54 ; G03F1/68 ; G03F7/20 ; H01L21/027 ; G03F9/00
摘要：
A reflection type mask includes a reflective portion effective to reflect soft X-rays or vacuum ultraviolet rays, and an absorbent material pattern formed on the reflecting portion, wherein, when the wavelength of the soft X-rays or vacuum ultraviolet rays is denoted by .lambda. and the optical constant of the material constituting the absorbent material pattern is denoted by 1-.delta.-ik (where .delta. and k are real numbers while i is an imaginary number), a relation 0.29
公开/授权文献
- US5092636A Sealing ring disposed in recessed flange member 公开/授权日：1992-03-03
信息查询
