发明授权
- 专利标题： Manufacture of etched substrates such as infrared detectors
- 专利标题（中）： 蚀刻基板如红外探测器的制造
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申请号： US290891申请日： 1994-10-20
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公开(公告)号： US5647954A公开(公告)日： 1997-07-15
- 发明人: Brian Edward Matthews
- 申请人： Brian Edward Matthews
- 申请人地址： GB2 Middlesex
- 专利权人： GEC Marconi Limited
- 当前专利权人： GEC Marconi Limited
- 当前专利权人地址： GB2 Middlesex
- 优先权： GBX9204078 19920226
- 主分类号： H01L21/306
- IPC分类号： H01L21/306 ; H01L21/308 ; H01L21/465 ; H01L21/467 ; H01L31/10 ; H01L21/00
摘要：
A narrow and deep aperture is chemically etched in or through a body of, for example, cadmium mercury telluride or other infrared sensitive material. The etchant is constrained and etches faster adjacent to side walls of a mask on the body. Those side walls are sufficiently close to each other than the faster etching areas overlap. Apertures or slots having a width of about 7 um may be etched in this manner through a thickness of about 5 um via windows having a width of about 3 um in a photo resist of a thickness between 4 and 5 um.
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