Invention Grant
- Patent Title: Method for fine patterning of a polymeric film
- Patent Title (中): 聚合物膜精细图案化的方法
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Application No.: US618606Application Date: 1996-03-20
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Publication No.: US5647999APublication Date: 1997-07-15
- Inventor: Tetsuya Tada , Toshihiko Kanayama
- Applicant: Tetsuya Tada , Toshihiko Kanayama
- Applicant Address: JPX Tokyo
- Assignee: Japan as represented by Director General of Agency of Industrial Science and Technology
- Current Assignee: Japan as represented by Director General of Agency of Industrial Science and Technology
- Current Assignee Address: JPX Tokyo
- Priority: JPX7-115531 19950515
- Main IPC: H01L21/302
- IPC: H01L21/302 ; C23F1/00 ; G03F7/00 ; H01L21/3065 ; B44C1/22 ; H01L21/00
Abstract:
A unique method is proposed for fine patterning of a polymeric resin film on a substrate surface or fine patterning of the substrate surface with the patterned resin film as the resist. The method comprises the steps of: (a) forming a thin film of the resin on the substrate surface; (b) pressing the resin film pattern-wise under a pressure in a specified range by using, for example, a fine needle tip so as to enhance adhesion of the resin molecules to the substrate surface; and (c) dissolving away the resin film with an organic solvent selectively in the areas where the pressure is not applied in step (c) leaving the resin in a pattern-wise area after application of the pressure. The fineness of this patterning can be extremely high to be in the molecular size order.
Public/Granted literature
- US5114453A Lightwave guide produced by ion exchange of cs+ ions Public/Granted day:1992-05-19
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