发明授权
- 专利标题: Superlattice avalanche photodiode with mesa structure
- 专利标题(中): 超晶格雪崩光电二极管与台面结构
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申请号: US576649申请日: 1995-12-21
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公开(公告)号: US5654578A公开(公告)日: 1997-08-05
- 发明人: Isao Watanabe
- 申请人: Isao Watanabe
- 申请人地址: JPX
- 专利权人: NEC Corporation
- 当前专利权人: NEC Corporation
- 当前专利权人地址: JPX
- 优先权: JPX6-335438 19941222
- 主分类号: H01L31/0352
- IPC分类号: H01L31/0352 ; H01L31/107 ; H01L31/075 ; H01L31/105 ; H01L31/117
摘要:
A superlattice avalanche photodiode with a mesa structure is provided, which enables to keep its noise characteristic low for a long time without decreasing the dynamic range for high-speed response. The photodiode has a semiconductor superlattice carrier multiplication layer, a first semiconductor electric-field buffer layers of a first conductivity type formed on one side of the carrier multiplication layer, and a second semiconductor electric-field buffer layer of a second conductivity type formed on the other side of the carrier multiplication layer. The photodiode further has a semiconductor light-absorbing layer of the second conductivity type formed on the second electric-field buffer layer. At least the light-absorbing layer constitutes the mesa structure. The first electric-field buffer layer is made of a central part and a peripheral part surrounding the central part. The peripheral part has a greater electric-field relaxation effect than that of the central part. The interface damage of the light-absorbing layer is restrained through the difference of the electric-field relaxation effect.
公开/授权文献
- US4614019A Film loading method and apparatus 公开/授权日:1986-09-30
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