发明授权
- 专利标题： Method for enhancing the toughness of CVD diamond
- 专利标题（中）： 提高CVD金刚石韧性的方法
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申请号： US654815申请日： 1996-05-29
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公开(公告)号： US5672395A公开(公告)日： 1997-09-30
- 发明人: Thomas R. Anthony , William F. Banholzer , Clifford L. Spiro , Steven W. Webb , Bradley E. Williams
- 申请人： Thomas R. Anthony , William F. Banholzer , Clifford L. Spiro , Steven W. Webb , Bradley E. Williams
- 申请人地址： MA Pittsfield
- 专利权人： General Electric Company
- 当前专利权人： General Electric Company
- 当前专利权人地址： MA Pittsfield
- 主分类号： C23C16/26
- IPC分类号： C23C16/26 ; C23C16/27 ; C23C16/56 ; B05D3/00
摘要：
A method for treating as as-grown chemical vapor deposited (CVD) starting diamond film having stresses and containing voids, comprises the step of subjecting the diamond film to a temperature of above about 1000.degree. C. and a hydrostatic pressure of above about 3 kilobars.
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