发明授权
- 专利标题： Vacuum processing system
- 专利标题（中）： 真空加工系统
-
申请号： US612465申请日： 1996-03-07
-
公开(公告)号： US5685684A公开(公告)日： 1997-11-11
- 发明人: Shigekazu Kato , Naoyuki Tamura , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou , Kenji Nakata , Yoshifumi Ogawa
- 申请人： Shigekazu Kato , Naoyuki Tamura , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou , Kenji Nakata , Yoshifumi Ogawa
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX2-317810 19901126; JPX6-130124 19940613
- 主分类号： B65G49/07
- IPC分类号： B65G49/07 ; H01L21/677 ; B65H5/08
摘要：
A vacuum treating apparatus having a vacuum treating chamber for treating a to-be-treated substrate in vacuum, includes a plurality of substrate cassettes which are installed in the open air and hold substrates that are to be conveyed into the vacuum treating chamber, a device for conveying the substrates between the substrate cassettes and the vacuum treating chamber, and a device which selects either that the to-be-treated substrate after treated in the vacuum treating chamber be held in the substrate cassette from which the to-be-treated substrate was taken out or that the to-be-treated substrate after treated in the vacuum treating chamber be held in another substrate cassette which is different from the substrate cassette.
公开/授权文献
- US5036802A Reverse rotation engine 公开/授权日：1991-08-06
信息查询
IPC分类:
