-
公开(公告)号：US5685684A
公开(公告)日：1997-11-11
申请号：US612465
申请日：1996-03-07
申请人： Shigekazu Kato , Naoyuki Tamura , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou , Kenji Nakata , Yoshifumi Ogawa
发明人： Shigekazu Kato , Naoyuki Tamura , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou , Kenji Nakata , Yoshifumi Ogawa
IPC分类号： B65G49/07 , H01L21/677 , B65H5/08
CPC分类号： H01L21/67778 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A vacuum treating apparatus having a vacuum treating chamber for treating a to-be-treated substrate in vacuum, includes a plurality of substrate cassettes which are installed in the open air and hold substrates that are to be conveyed into the vacuum treating chamber, a device for conveying the substrates between the substrate cassettes and the vacuum treating chamber, and a device which selects either that the to-be-treated substrate after treated in the vacuum treating chamber be held in the substrate cassette from which the to-be-treated substrate was taken out or that the to-be-treated substrate after treated in the vacuum treating chamber be held in another substrate cassette which is different from the substrate cassette.
摘要翻译： 一种具有真空处理室的真空处理装置，其特征在于，包括：多个基板盒，其安装在所述露天空间中并保持要被输送到所述真空处理室的基板;装置 用于在基板盒和真空处理室之间输送基板，以及选择在真空处理室中处理后的被处理基板被保持在待处理基板的基板盒中的装置 或将真空处理室中处理后的被处理基板保持在与基板盒不同的另一基板盒中。
-
公开(公告)号：US5663884A
公开(公告)日：1997-09-02
申请号：US461523
申请日：1995-06-05
IPC分类号： G05B15/02 , G05B19/418 , H01L21/677 , G06F17/00
CPC分类号： G05B19/4184 , G05B19/41845 , G05B2219/31361 , G05B2219/31362 , G05B2219/35291 , G05B2219/45026 , Y02P90/14 , Y02P90/16 , Y10S414/135 , Y10S414/139 , Y10S414/14
摘要： A multiprocessing apparatus has a plurality of process processors connected to a carrier processor and controlled by a control system, wherein the apparatus includes connection information signal generating means for generating a connection information signal expressing information of connection of the plurality of process processors to the carrier processor, switching means for generating a registration information signal expressing information of registration of connection of the plurality of process processors to the carrier processor, and control means for carrying out a control process while logically judging a matching state between the connected process processors and the registered process processors by reference to the connection information and the registration information. Thus, it is possible to provide a multiprocessing apparatus in which process processors to be connected to the carrier processor can be increased or decreased in number easily and securely.
摘要翻译： 多处理装置具有连接到载波处理器并由控制系统控制的多个处理处理器，其中该装置包括连接信息信号产生装置，用于产生表示多个处理处理器连接到载波处理器的信息的连接信息信号 用于产生表示多个处理处理器的连接登记信息到载波处理器的登记信息信号的切换装置，以及用于在逻辑判断连接的处理处理器之间的匹配状态和登记处理的同时执行控制处理的控制装置 处理器参考连接信息和注册信息。 因此，可以提供一种可以容易且可靠地增加或减少要连接到载波处理器的处理器的多处理装置。
-
公开(公告)号：US5445484A
公开(公告)日：1995-08-29
申请号：US131911
申请日：1993-10-04
IPC分类号： B01J3/02 , B65G49/07 , H01L21/677 , B65G49/05
CPC分类号： H01L21/67778 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A vacuum processing system of a type in which wafer cassettes each accommodating a plurality of wafers to be treated are supplied to deliver the wafers and wafer cassettes collecting the treated wafers are taken out. To enable the vacuum treatment, the vacuum processing system has a structure comprising:a plurality of wafer cassettes each being set in the atmospheric air and holding a plurality of wafers to be treated; at least one vacuum processing chamber for effecting vacuum treatment on the wafers; at least one load-lock chamber disposed between the cassettes and the vacuum processing chamber, the wafers being transferred into and out of vacuum atmosphere in the vacuum processing chamber through the load-lock chamber; and a wafer transfer device for transferring the wafers from each of the cassettes to the load-lock chamber and vice versa. The wafer cassettes are arranged on a substantially horizontal flat surface with respect to each other and each of the cassettes has two upper and lower stationary positions, and the transference of the wafers from and into each of the cassettes is conducted at one of the upper and lower stationary positions.
摘要翻译： 提供一种类型的真空处理系统，其中提供各自容纳待处理的多个晶片的晶片盒以传送晶片，并且收集经处理的晶片的晶片盒被取出。 为了进行真空处理，真空处理系统具有如下结构：多个晶片盒分别设置在大气中并保持待处理的多个晶片; 至少一个用于对所述晶片进行真空处理的真空处理室; 设置在盒和真空处理室之间的至少一个装载锁定室，所述晶片通过所述装载锁定室转移到所述真空处理室中的真空气氛中并从所述真空处理室中排出; 以及用于将晶片从每个盒传送到装载锁定室的晶片传送装置，反之亦然。 晶片盒相对于彼此布置在基本水平的平坦表面上，并且每个盒具有两个上部和下部固定位置，并且每个盒的晶片从每个盒的转移在上部和下部的一个处进行 较低的固定位置。
-
公开(公告)号：US5673750A
公开(公告)日：1997-10-07
申请号：US460600
申请日：1995-06-02
CPC分类号： C23C16/466 , C23C14/50 , C23C14/541 , C23C16/4583 , C23C16/4586 , C30B33/00 , H01L21/67103
摘要： This invention relates to a vacuum processing method and apparatus. When a sample is plasma processed under a reduced pressure, a sample bed is cooled by a cooling medium kept at a predetermined temperature lower than an etching temperature, the sample is held on the sample bed, a heat transfer gas is supplied between the back of the sample and the sample installation surface of the sample bed, and the pressure of the heat transfer gas is controlled so as to bring the sample to a predetermined processing temperature. Before the step of holding the sample on the sample bed and supplying the heat transfer gas, heat transfer gas remaining upstream and downstream of the flow rate regulator in the supply line for the heat transfer gas is vacuum exhausted. This is accomplished using a bypass line connected upstream and downstream of the flow rate regulator and an arrangement of appropriate valves.
摘要翻译： 本发明涉及一种真空处理方法和装置。 当样品在减压下进行等离子体处理时，样品床被保持在比蚀刻温度低的预定温度的冷却介质冷却，样品被保持在样品床上，传热气体在 样品床的样品和样品安装表面以及传热气体的压力被控制以使样品达到预定的处理温度。 在将样品保持在样品床上并供给传热气体的步骤之前，用于传热气体的供给管线中的流量调节器的上游和下游的传热气体被真空排空。 这是使用连接在流量调节器的上游和下游的旁路管线和适当的阀的布置来实现的。
-
公开(公告)号：US5078851A
公开(公告)日：1992-01-07
申请号：US556449
申请日：1990-07-24
IPC分类号： C23C16/448 , C23C16/509 , C23C16/511 , H01J37/32 , H01L21/00
CPC分类号： H01L21/67103 , C23C16/448 , C23C16/509 , C23C16/511 , H01J37/32192 , H01J2237/2001
摘要： The present invention relates to a plasma processor in which a sample such as semiconductor substrate is processed with a plasma under a cooled state. An electric insulator is interposed between a sample holder for arranging the sample thereon and a cooling container for cooling the sample holder, so as to electrically insulate them, whereby a bias voltage applied to the sample holder and a voltage for generating the plasma can be prevented from leaking, so as to stabilize the process. In addition, the insulator is held in close contact with the sample holder and the cooling container through members of a thermal conductor, whereby the occurrence of non-uniformity during the processing of the sample and the occurrence of a dispersion in the qualities of processed samples among sample lots or among processors can be suppressed.
-
公开(公告)号：US5448470A
公开(公告)日：1995-09-05
申请号：US941905
申请日：1992-09-08
IPC分类号： G05B15/02 , G05B19/418 , H01L21/677 , G06F15/46
CPC分类号： G05B19/4184 , G05B19/41845 , G05B2219/31361 , G05B2219/31362 , G05B2219/35291 , G05B2219/45026 , Y02P90/14 , Y02P90/16 , Y10S414/135 , Y10S414/139 , Y10S414/14
摘要： A multiprocessing apparatus has a plurality of process processors connected to a carrier processor and controlled by a control system, wherein there are provided connection information signal generating means for generating a connection information signal expressing information of connection of the plurality of process processors to the carrier processor; switching means for generating a registration information signal expressing information of registration of connection of the plurality of process processors to the carrier processor; and control means for carrying out a control process while logically judging a matching state between the connected process processors and the registered process processors by reference to the connection information and the registration information. Thus, it is possible to provide a multiprocessing apparatus in which the number of process processors to be connected to the carrier processor can be securely increased or decreased.
摘要翻译： 多处理装置具有连接到载波处理器并由控制系统控制的多个处理处理器，其中提供有连接信息信号产生装置，用于产生表示多个处理处理器连接到载波处理器的信息的连接信息信号 ; 切换装置，用于产生表示将多个处理处理器的连接登记到载波处理器的信息的登记信息信号; 以及控制装置，用于通过参考连接信息和注册信息逻辑地判断连接的处理处理器和注册的处理处理器之间的匹配状态来执行控制处理。 因此，可以提供一种可以可靠地增加或减少要连接到载波处理器的处理器的数量的多处理装置。
-
公开(公告)号：US5320982A
公开(公告)日：1994-06-14
申请号：US724801
申请日：1991-07-02
IPC分类号： C23C14/50 , C23C14/54 , C23C16/458 , C30B33/00 , H01L21/00 , H01L21/465
CPC分类号： C23C16/466 , C23C14/50 , C23C14/541 , C23C16/4583 , C23C16/4586 , C30B33/00 , H01L21/67103 , H01L21/67109 , Y10T279/23
摘要： This invention relates to a vacuum processing method and apparatus. When a sample is plasma-processed under a reduced pressure, a sample bed is cooled by a cooling medium kept at a predetermined temperature lower than an etching temperature, the sample is held on the sample bed, a heat transfer gas is supplied between the back of the sample and the sample installation surface of the sample bed, and the pressure of the heat transfer gas is controlled so as to bring the sample to a predetermined processing temperature. In this way, a sample temperature can be regulated rapidly without increasing the scale of the apparatus.
摘要翻译： 本发明涉及一种真空处理方法和装置。 当样品在减压下进行等离子体处理时，样品床被保持在低于蚀刻温度的预定温度的冷却介质冷却，将样品保持在样品床上，在后面提供传热气体 的样品和样品安装表面，并且控制传热气体的压力以使样品达到预定的处理温度。 以这种方式，可以快速调节样品温度，而不会增加设备的规模。
-
公开(公告)号：US06676805B2
公开(公告)日：2004-01-13
申请号：US10107138
申请日：2002-03-28
申请人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
发明人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
IPC分类号： H05H100
CPC分类号： H01L21/6835 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L2924/3025 , Y10T279/23
摘要： A method and system of holding a substrate where foreign substances on the back surface can be decreased. The substrate holding system comprises a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.
摘要翻译： 可以减少背面上的异物的保持基板的方法和系统。 基板保持系统包括：在与基板周边相对应的样品台上具有光滑表面的环形防漏表面，在基板周边内的多个接触保持部分，以及用于固定基板的静电吸引装置 通过使基板的背面与环状的防漏面和接触保持部接触。 基板在环状防漏面与冷却面接触，接触保持部位置于环状防漏面内。 衬底的背面和冷却表面在剩余区域的大部分中彼此不接触。
-
公开(公告)号：US5906684A
公开(公告)日：1999-05-25
申请号：US50417
申请日：1998-03-31
申请人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
发明人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
IPC分类号： H01L21/00 , H01L21/68 , H01L21/683 , C23C16/00 , H05H1/00
CPC分类号： H01L21/6835 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L2924/3025 , Y10T279/23
摘要： In a method of holding a substrate and a substrate holding system where, the amount of foreign substances on the back surface of the substrate can be decreased and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exposed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.
摘要翻译： 在保持基板和基板保持系统的方法中，可以减少基板的背面上的异物量，并且只有少量的异物从安装台传递到基板。 为此，基板保持系统具有环形防漏表面，在对应于基板的周边的样品台上提供平滑的支撑表面，多个接触保持部分抵靠在样品台上的基板上， 与基板周边相对应的位置和与基板中心相对应的位置，以及静电吸引装置，用于通过使基板的背面与环状的防漏表面接触而固定基板，以及接触保持部 。 将基板暴露于环状防漏表面处的冷却表面和位于环形防漏表面内的位置处的接触保持部。 基板的后表面和冷却表面在剩余区域的大部分中彼此不接触。
-
公开(公告)号：US5985035A
公开(公告)日：1999-11-16
申请号：US109033
申请日：1998-07-02
申请人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
发明人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
IPC分类号： H01L21/00 , H01L21/68 , H01L21/683 , C23C16/00 , H05H1/00
CPC分类号： H01L21/6835 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L2924/3025 , Y10T279/23
摘要： In a method of holding a substrate and a substrate holding system, the amount of foreign substances on the back surface of the substrate can be decreased and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exposed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.
摘要翻译： 在保持基板和基板保持系统的方法中，可以减少基板的背面上的异物的量，并且只有少量的异物从安装台传递到基板。 为此，基板保持系统具有环形防漏表面，在对应于基板的周边的样品台上提供平滑的支撑表面，多个接触保持部分抵靠在样品台上的基板上， 与基板周边相对应的位置和与基板中心相对应的位置，以及静电吸引装置，用于通过使基板的背面与环状的防漏表面接触而固定基板，以及接触保持部 。 将基板暴露于环状防漏表面处的冷却表面和位于环形防漏表面内的位置处的接触保持部。 基板的后表面和冷却表面在剩余区域的大部分中彼此不接触。
-
-
-
-
-
-
-
-
-
搜索结果
72 条记录 (耗时 0.031 秒)
