A semiconductor device having two or more unit circuit-blocks is produced by (a) forming in a chip area on a substrate two or more circuit-blocks by repeating, a required number of times, a process comprising exposing in sequence each block section within each chip area coated with a resist film, using masks for making respective circuit-blocks, developing a resist pattern, and a subsequent process using the pattern, and (b) forming external interconnections between the circuit-blocks using a resist pattern formed over the circuit-blocks.