发明授权
US5706091A Apparatus for detecting a mark pattern on a substrate 失效
用于检测基板上的标记图案的装置

  • 专利标题: Apparatus for detecting a mark pattern on a substrate
  • 专利标题(中): 用于检测基板上的标记图案的装置
  • 申请号: US639099
    申请日: 1996-04-26
  • 公开(公告)号: US5706091A
    公开(公告)日: 1998-01-06
  • 发明人: Naomasa Shiraishi
  • 申请人: Naomasa Shiraishi
  • 申请人地址: JPX Tokyo
  • 专利权人: Nikon Corporation
  • 当前专利权人: Nikon Corporation
  • 当前专利权人地址: JPX Tokyo
  • 优先权: JPX7-106556 19950428; JPX7-136783 19950602
  • 主分类号: G03F7/20
  • IPC分类号: G03F7/20 G03F9/00 G01B11/00
Apparatus for detecting a mark pattern on a substrate
摘要:
Illuminating light at a pupil plane of an illumination optical system for illuminating a position detection mark on a substrate is limited to an annular area centered at an optical axis, and a member substantially blocks an image-forming light beam distributed over an area on a pupil plane of an image-forming optical system for forming an image of the position detection mark on an imaging device by receiving light generated from the mark, the area being in image-forming relation to the annular area on the pupil plane of the illumination optical system. Alternatively, a member gives a phase difference of approximately .pi./2 �rad! between the image-forming light beam distributed over the area which is in image-forming relation to the annular area on the pupil plane of the illumination optical system and the image-forming light beam distributed over the area other than that area.
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