发明授权
- 专利标题: Carbapenem derivatives
- 专利标题(中): 卡巴培南衍生物
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申请号: US696910申请日: 1996-08-23
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公开(公告)号: US5707987A公开(公告)日: 1998-01-13
- 发明人: Susumu Nakagawa , Hiroshi Fukatsu , Ryosuke Ushijima
- 申请人: Susumu Nakagawa , Hiroshi Fukatsu , Ryosuke Ushijima
- 申请人地址: JPX Tokyo
- 专利权人: Banyu Pharmaceutical Co., Ltd.
- 当前专利权人: Banyu Pharmaceutical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX6-052686 19940225; JPX6-064606 19940308; JPX6-107568 19940422; JPX6-110289 19940426; JPX6-114288 19940428
- 主分类号: A61K31/407
- IPC分类号: A61K31/407 ; A61K31/695 ; A61P31/04 ; C07D477/20 ; C07D519/06 ; C07F7/10 ; A61K31/40 ; C07D487/04
摘要:
A compound of the formula: ##STR1## wherein R.sup.1 is a hydrogen atom or a lower alkyl group, R.sup.2 is a hydrogen atom or a negative charge, R.sup.3 is a hydrogen atom or a lower alkyl group, Ar is a phenyl group, a naphthyl group or a group of: ##STR2## (wherein each of A.sub.4 and A.sub.5 is a single bond, --NHSO.sub.2 -- or the like, and Het is a pyrrolinyl group, a 1,4-diazabicyclo�2.2.2!octanyl group or the like which may be substituted with a hydroxyl group, a carbamoyl lower alkyl group or the like) which may be substituted with a lower alkyl group, a lower alkylsulfamoyl group or the like which may be substituted with a hydroxyl group, a di-lower alkylsulfonyl group or the like; a hydroxyl group; a di-lower alkylsulfamoyl group or the like, each of A.sub.1, A.sub.2 and A.sub.3 is a single bond or a lower alkylene group which may be substituted with a lower alkyl group, a lower alkylsulfamoyl group or the like which may be substituted with a hydroxyl group, a di-lower alkylsulfamoyl group or the like; a pyridyl group or a pyridino group; and W is a sulfur atom, a single bond; or a pharmaceutically acceptable salt or ester; a process for its production and an antibacterial agent containing it as an active ingredient.
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