发明授权
US5712698A Independently controllable shutters and variable area apertures for off
axis illumination
失效
独立可控的百叶窗和用于离轴照明的可变面积孔
- 专利标题： Independently controllable shutters and variable area apertures for off axis illumination
- 专利标题（中）： 独立可控的百叶窗和用于离轴照明的可变面积孔
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申请号： US610770申请日： 1996-03-04
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公开(公告)号： US5712698A公开(公告)日： 1998-01-27
- 发明人: Bernhard Poschenrieder , Takashi Sato , Tsukasa Azuma
- 申请人： Bernhard Poschenrieder , Takashi Sato , Tsukasa Azuma
- 申请人地址： DEX Munich JPX Kanagawa-ken
- 专利权人： Siemens Aktiengesellschaft,Kabushiki Kaisha Toshiba
- 当前专利权人： Siemens Aktiengesellschaft,Kabushiki Kaisha Toshiba
- 当前专利权人地址： DEX Munich JPX Kanagawa-ken
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027 ; G03B27/72
摘要：
New types of apertures to vary the size and shape of the aperture area without the need to change the whole aperture plate in off axis lithography. The off axis illumination apertures allow the size and shape of apertures to be changed without having to change the aperture plates for each step in the lithographic process. The aperture plate is fitted with simple shutter mechanisms that allow the ready adjustment of the aperture openings.
公开/授权文献
- US5226072A Facsimile machine having recording/reproducing apparatus 公开/授权日：1993-07-06
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