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US5718992A Substrate having light shielding layer 失效
基板具有遮光层

Substrate having light shielding layer
Abstract:
A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.
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