发明授权
- 专利标题: Magnetic recording medium
- 专利标题(中): 磁记录介质
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申请号: US516046申请日: 1995-08-17
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公开(公告)号: US5720861A公开(公告)日: 1998-02-24
- 发明人: Hideo Kaneko , Katsushi Tokunaga , Yoshio Tawara
- 申请人: Hideo Kaneko , Katsushi Tokunaga , Yoshio Tawara
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX6-218893 19940913; JPX6-248989 19941014
- 主分类号: G11B5/73
- IPC分类号: G11B5/73 ; G11B5/851 ; C23C14/34
摘要:
An improvement is proposed in the method for the preparation of a magnetic recording medium comprising a non-magnetic substrate plate of silicon and a magnetic recording layer formed on the substrate surface by the method of bias-sputtering, by which the magnetic recording layer can be imparted with an unexpectedly large coercive force. The improvement can be accomplished by the use of a silicon substrate plate which has a volume resistivity not exceeding 2 ohm-cm at room temperature. The improvement is more remarkable when the contact resistance between the silicon substrate plate and the substrate holder is kept not to exceed 10 kohm during the bias-sputtering for the formation of the magnetic recording layer on the substrate surface.
公开/授权文献
- US4472570A Polyarylene esters containing phosphorus 公开/授权日:1984-09-18