发明授权
- 专利标题: Method for manufacturing accelerometer sensor
- 专利标题(中): 制造加速度传感器的方法
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申请号: US604720申请日: 1996-02-21
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公开(公告)号: US5725785A公开(公告)日: 1998-03-10
- 发明人: Tatsuya Ishida , Akihiko Watanabe
- 申请人: Tatsuya Ishida , Akihiko Watanabe
- 申请人地址: JPX Aichi-ken
- 专利权人: Kabushiki Kaisha Tokai Rika Denki Seisakusho
- 当前专利权人: Kabushiki Kaisha Tokai Rika Denki Seisakusho
- 当前专利权人地址: JPX Aichi-ken
- 优先权: JPX7-035513 19950223
- 主分类号: B81B3/00
- IPC分类号: B81B3/00 ; G01P15/08 ; G01P15/12 ; H01L29/84 ; H01L21/00 ; B44C1/22
摘要:
A method of manufacturing an accelerometer sensor having a mass portion is disclosed. A P-type silicon area is formed in an upper area of a P-type silicon substrate by means of impurity doping. An N-type silicon layer is formed on the silicon substrate through vapor phase epitaxy. A recess defining the mass portion is formed in the silicon substrate through an etching process. A current is supplied to the silicon substrate in an electrolytic solution, such as HF aq., while the substrate is connected to an anode of a power supply. The P-type silicon area is then converted to a porous silicon area. The porous silicon area is subjected to a wet etching to be hollowed, thus obtaining a mass portion of a desired shape.
公开/授权文献
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