发明授权
US5728260A Low volume gas distribution assembly and method for a chemical downstream etch tool 失效
低体积气体分配组件和化学下游蚀刻工具的方法

Low volume gas distribution assembly and method for a chemical
downstream etch tool
摘要:
An improved low-volume gas distribution assembly for a chemical downstream etch tool includes a focusing collar positioned within a process chamber and having a depending shroud in close proximity to a wafer chuck. An apertured gas delivery conduit rests on channels formed in slanted sides of a central tube of the focusing collar. The apertures in the gas delivery conduit are patterned and dimensioned to provide substantially uniform distribution of a process gas over the upper surface of the workpiece. The central tube is sealed with a cover plate and the process chamber is covered with a chamber lid.
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