发明授权
US5728260A Low volume gas distribution assembly and method for a chemical
downstream etch tool
失效
低体积气体分配组件和化学下游蚀刻工具的方法
- 专利标题: Low volume gas distribution assembly and method for a chemical downstream etch tool
- 专利标题(中): 低体积气体分配组件和化学下游蚀刻工具的方法
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申请号: US654958申请日: 1996-05-29
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公开(公告)号: US5728260A公开(公告)日: 1998-03-17
- 发明人: William Brown , Harald Herchen , Ihi Nzeadibe , Walter Merry
- 申请人: William Brown , Harald Herchen , Ihi Nzeadibe , Walter Merry
- 申请人地址: CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/302
- IPC分类号: H01L21/302 ; H01J37/32 ; H01L21/3065 ; H01L21/00 ; C23F1/00
摘要:
An improved low-volume gas distribution assembly for a chemical downstream etch tool includes a focusing collar positioned within a process chamber and having a depending shroud in close proximity to a wafer chuck. An apertured gas delivery conduit rests on channels formed in slanted sides of a central tube of the focusing collar. The apertures in the gas delivery conduit are patterned and dimensioned to provide substantially uniform distribution of a process gas over the upper surface of the workpiece. The central tube is sealed with a cover plate and the process chamber is covered with a chamber lid.
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