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发明授权
US5728508A Method of forming resist pattern utilizing fluorinated resin antireflective film layer 失效
利用氟化树脂防反射膜层形成抗蚀剂图案的方法

Method of forming resist pattern utilizing fluorinated resin antireflective film layer
摘要：
A method of forming a resist pattern comprising forming a photoresist layer on a substrate, forming a transparent anti-reflective film on said photoresist layer by applying an anti-reflective material onto said photoresist layer, said anti-reflective material comprising a fluorinated resin which is soluble in an organic hydrocarbon solvent, exposing a light to said resist layer through said transparent anti-reflective film, removing said anti-reflective film using an organic hydrocarbon solvent, and developing said photoresist layer.
摘要（中）：

一种形成抗蚀剂图案的方法，包括在基材上形成光致抗蚀剂层，在所述光致抗蚀剂层上形成透明的抗反射膜，通过在所述光致抗蚀剂层上施加抗反射材料，所述抗反射材料包括氟化树脂， 可溶于有机烃溶剂中，通过所述透明抗反射膜将光暴露于所述抗蚀剂层，使用有机烃溶剂除去所述抗反射膜，并显影所述光致抗蚀剂层。

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