发明授权
- 专利标题: Pellicle for a mask or substrate
- 专利标题(中): 掩模或底物的防护薄膜
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申请号: US789425申请日: 1997-01-29
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公开(公告)号: US5729325A公开(公告)日: 1998-03-17
- 发明人: Meguru Kashida
- 申请人: Meguru Kashida
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX8-035536 19960130
- 主分类号: B08B17/00
- IPC分类号: B08B17/00 ; G03F1/62 ; H01L21/027 ; G03B27/52 ; G02B7/00 ; G03B11/04
摘要:
A pellicle for a mask or substrate including a frame having one end surface and another end surface and a membrane extended over the frame on the one end surface side. A channel is formed in the other end surface of the frame. The channel is filled with a layer of a tackifier capable of expanding upon heating and/or light irradiation such that the tackifier layer does not protrude outward beyond the other end surface of the frame in an unexpanded state, but protrudes outward beyond the other end surface of the frame when expanded. No liner is attached to the tackifier layer.
公开/授权文献
- US5162833A Camera 公开/授权日:1992-11-10
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