发明授权
- 专利标题: Compartnetalized substrate processing chamber
- 专利标题(中): 基板处理室
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申请号: US296043申请日: 1994-08-23
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公开(公告)号: US5730801A公开(公告)日: 1998-03-24
- 发明人: Avi Tepman , Gerald Zheyao Yin , Donald Olgado
- 申请人: Avi Tepman , Gerald Zheyao Yin , Donald Olgado
- 申请人地址: CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/302
- IPC分类号: H01L21/302 ; B65G49/07 ; H01L21/00 ; H01L21/02 ; H01L21/20 ; H01L21/306 ; H01L21/677 ; C23C16/00
摘要:
A process chamber for semiconductor wafers is formed of multiple compartments. A first compartment is provided for supplying an isolated environment for processing the wafers, and a second compartment is provided, in selective communication with the first compartment, to load and unload wafers from the chamber. The wafer handling equipment is located in the second compartment to isolate it from the process environment, and thus form a clean, non-contaminating, environment for the wafer handling equipment. When the chamber must be cleaned, only the first compartment must be cleaned, as no processing occurs in the second chamber. Therefore, the entire first chamber may be removed for cleaning, and replaced with a clean first compartment to decrease chamber turnaround time during chamber cleaning operations.
公开/授权文献
- US4444063A Torque measuring systems 公开/授权日:1984-04-24